Abstract
In recent years, optical lithography technology used for micro fabrication of electronic devices, semiconductors, etc. has continues to advance for the purpose of cost reduction and improvement. However, plenty of transfer failure caused by air entrained when pressing the mold against the material to be transferred or gas generated from the resist material were reported in the nanoimprint process. Therefore, in order to develop a novel template material with gas permeability, chemical modification of crystalline cellulose with different viscosity and molecular weight was evaluated the physical properties in this study. By using this gas permeable template material as a mold, a transfer material containing acetone as a volatile solvent was molded. As a result, a shape of 5 μm was transferred to be the material containing a volatile solvent, and no defect due to a gas generated from a volatile solvent was confirmed. This gas permeable template material can be expected to reduce transfer defects in imprints and can be said to have a possibility to broaden the selectivity of resist materials.
