Abstract
Three-component chemically amplified photoresists which are consisted of a base resin, a photo acid generator and a dissolution inhibitor are promising because the high sensitivity and the high resolution can be satisfied at the same time. We studied about the dissolution promotion effect of hydroquinone (HQ) in the exposed area. HQ is a model compound of the photo induced product of the dissolution inhibitor. We disclosed that HQ depressed a glass transition temperature (Tg) of the base resin and the sensitivity was improved by enhancing the dissolution rate in the exposed area. It is expected that the dissolution rate was promoted when the post exposure bake temperature exceeded Tg because the acid diffuse more easily.
