Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
New Organic Photo-Curable Nanoimprint Resist ≪mr-NIL210≫ for High Volume Fabrication Applying Soft PDMS-Based Stamps
Martin MesserschmidtAndrew GreerFlorian SchlachterJulian BarnettManuel W. ThesenNikolaj GadegaardGabi GrutznerArne Schleunitz
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2017 Volume 30 Issue 5 Pages 605-611

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Abstract

Herein, we report on a newly developed and commercialized organic photo-curable Nanoimprint Lithography (NIL) resist, namely mr-NIL210. Since this new NIL resist follows an innovative design concept and contains solely specific monomers with a characteristic chemistry and molecular design, an extended longevity of applied polydimethyl siloxane (PDMS) stamps is enabled addressing a crucial key metric for industrial high-volume manufacturing processes. Moreover, the mr-NIL210 is characterized by a negligible oxygen sensitivity of the curing chemistry, outstanding film forming and adhesion performances as well as excellent plasma-based dry etch characteristics for various substrate materials like silicon, aluminum, sapphire, titanium, etc.

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© 2017 The Society of Photopolymer Science and Technology (SPST)
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