Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
In-Situ Measurement of Outgassing Generated from EUV Metal Oxide Nanoparticles Resist During Electron Irradiation
Seiji TakahashiHiroko MinamiYoko MatsumotoYoichi MinamiMikio KadoiAtsushi SekiguchiTakeo Watanabe
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2018 Volume 31 Issue 2 Pages 257-260

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Abstract
In this study, we prepared the EUV metal resist, which included ZrO2 nano-particle and three type ligands as 2-methyl-2-propenoic acid (MAA), 2-methylpropanoic acid (IBA) and vinylbenzoic acid (VBA). Each resist was prepared by blending each material separately for evaluating the outgassing from EUV resist materials. We prepared three-type samples of ZrO2-MAA, ZrO2-IBA and ZrO2-VBA by coating each resist, and evaluated the outgassing from these samples during irradiation of 2 keV electron by in-situ mass spectrometry. From the results of mass spectrum, we could observe the outgassing of PAG as unique peaks. And each ligand peak was distributed over the low mass range. On the other hand, the ZrO2 peaks could not be observe in mass spectrum of each sample. Thus, we guess that ZrO2 nano-particles might not be evaporating during 2 keV electron irradiation.
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© 2018 The Society of Photopolymer Science and Technology (SPST)
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