抄録
Ultraviolet-nanoimprint lithography (UV-NIL) is a next-generation lithographic technology. However, its usefulness is negatively affected by the formation of an extra resin layer between the curable resin pattern and the substrate, which is known as the residual layer (RL). Liquid-transfer imprint lithography (LTIL) is a promising technique for reducing the RL. However, it is difficult to ensure a thin RL with LTIL when using a high viscous UV curable resin. A technique combining LTIL and roll press can be used to overcome this drawback. High viscous UV curable resins generally possess high selectivity for dry etching and can exhibit various refractive indices. In this study, master molds were prepared with a patterned design and varying line and space values. The pattern ratio was 1:2, and the line widths were 990 nm, 540 nm, and 270 nm. UV curable resins with viscosities of 2900 mPa·s and 13090 mPa·s could be used to transfer the line and space patterns of three nanoscale widths to eliminate the RL, by using a repeated roll-press and LTIL technique and parallel plate UV-NIL.
