2020 Volume 32 Issue 6 Pages 799-804
This contribution summarizes advanced lithographic methods for polymeric 3D topographies based on the modification of the polymer molecular weight and applying thermal polymer reflow. Initial structures realized with grayscale electron beam and multi-photon lithography were reshaped due to thermal annealing close to the glass transition temperature following high-energy radiation. This allowed for new topographical functionalities such as aspheric and ultra-smooth freeform micro and nano-optics. The covered methods have in common that they exploit a specific contrast in molecular weight that enables post-processing and thus a transformation of the initial pattern by polymer reflow into a new surface topography or shape. Also, simulation methods are quickly summarized.