Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Molecular Design of Binder Resins Used in Positive Photoresists
Shangxian YuXiao TongJianxin LiLin WuJiangnan Gu
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ジャーナル フリー

1997 年 10 巻 2 号 p. 283-292

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抄録
By going through the design and the synthesis of lots of phenol resins, the comparison of properties of the resins used in positive resists, also by learning previous work of others, the main factors influencing properties of binder resin of positive resist are proved:
1. The ratio of the total mass of phenolic resin (M) to the total mass of phenolic hydroxyl group of phenolic resin(A), namely the M/A value.
2. The magnitude of molecular weight of phenolic resin and the molecular weight distribution.
3. The condensation-polymerization ratio or the addition ratio of phenolic resin in double ortho way, namely o, o-bond ratio(Roo).
We found that there is correlation among the three factors to some extend, then we propose an empirical equation on the design of binder resin.
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© The Technical Association of Photopolymers, Japan
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