抄録
The Fridel-Crafts reaction between dvinyl benzene (DVB) and resorcin produced a new type of photopolymer. When resorcin-DVB resins used in negative photoresists, 2um resolution can be reached [1]. When resorcin-DVB resins used as binder resins of PS plate and positive photoresists, they can fit with many kinds of photoactive compounds (PAC). The resolution of the positive resists can be lower than 0.95um. The exposure and developing rates of the positive photoresists are fast and they have good alkali resistance. Resorcin-DVB resins can be used as the ballast resins of diazonaphthoquinone (DNQ) group to synthesize DNQ-PAC. The positive photoresists whose PAC are resorcin-DVB diazonaphthoquinone have high resolution and the forming image has high contrast. During research, we also found that the alkali resistance of binder resin is closely relevant to the M/A value of the resin and the alkali resistance of PAC is closely relevant to the M/A value of the ballast resin.
