High Resolution EB Lithography on Organic Resists: Molecular Size Effect
1997 年 10 巻 4 号 p. 641-646
詳細
1997 年 10 巻 4 号 p. 641-646
The resolution of organic resists has been investigated as a function of base resin structure and molecular weight. Calixarene, which has a ring structure, and polystyrene, which has a chain structure, were used for the investigation. The polystyrene had different molecular weights. We show that a high-resolution lithography can be achieved using a organic resist with a low molecular weight, that is, a smaller molecular size. A 10-nmter level negative resist pattern is demonstrated.
