A Novel Low Molecular-Weight Organic Resist with High Sensitivity for Nanometer Lithography
キーワード:
amorphous molecular material,
molecular resist,
negative electron-beam resist,
sensitivity,
resolution,
1,3,5-tris[4-(4-vinylphenylcarbonyloxy)phenyl]benzene
1998 年 11 巻 1 号 p. 147-148
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