Improvement of stability for electroluminescent device(EL) was achieved by a rectangular drive scheme. An EL device was composed as Al/Al tris(8-hydroxyquinoline) (Alq3)/PVCz/ITO. This composed EL device showed half lifetimes 2 hours in atmosphere and 100hrs in vacuum. However, 1100hrs of lifetime was achieved by operating the EL device by the rectangular drive scheme. It is found that lifetime of the EL device is extended to 11 times as the normal do operation. Curve analysis of luminance from the EL device operated by a rectangular wave showed that luminous decay curve is caused by two species. One of both species depends on the rectangular scheme, while another is independent. Decay time for the independent species was found to be 1.1ms which is correspondent to recombination time between electrons and holes in EL layer..

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Application of the aliphatic polyesters are now gradually increasing as the so-called "Environmental plastics". These polyesters rapidly decompose in various soils and in sea water. On the other hand, it was found that these aliphatic polyesters easily degraded by UV irradiation. Photo degradation of the polyesters was tested by solar irradiation. The films were exposed at the rooftop of Kobe University building and utility of the aliphatic polyesters for the photo degradable plastics was tested

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Polycondensation of furan derivative by singlet oxygen, which was generated using the sensitizer such as fullerene C₆₀, was applied to the crosslinking of polymers. A polymer having furan units in the side chains was synthesized by the reaction of poly(2- hydroxyethylmethacrylate) with 2-furoic chloride. A toluene or 1, 1, 2, 2-tetrachloroethane solution of the polymer was exposed to visible light in the presence of several sensitizers. The solution turned to a gel after several hours and then solidified completely. It was demonstrated that this phenomenon could be applied to new photosensitive resin.

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Benzo[1, 2, 3-kl : 4, 5, 6-k′l′]dixanthene having amino, methyl, and nitro group was synthesized from 1, 5-dichloroanthraquinone in four steps. After quaternization with iodo- alkane, photochromic properties of monolayers on water surface and LB films on quartz glass were investigated.

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It has been known that photomerocyanine (PMC) compounds having two long alkyl chains form aJ-aggregate (head-to-tail) or H-aggregate (side-by-side) in bilayer membranes depending on the length and position of the introduced alkyl chain in the spiropyran moiety. The objective of this study is to obtain definiteinformation about the relationship between the formation and thermal decaykinetics for PMC in bilayermembranes, focusing attention on the characteristics of the J-aggregate (J-PMC). In this study, 8-[docosanoyloxymethyl]spiro- [2H-1-benzopyran-2, 2′-indoline] (SP1822) and dioctadecyldimethylammonium bromide (2C₁₈N⁺2C₁) were used as the PMC and bilayer matrices, respectively. The effects of molar mixing ratio (R=[SP1822]/[2C₁₈N⁺2C₁]) on the J-aggregated PMC formation and thermal decay kinetics were then scrutinized. As a result, as R or the aggregate dimension increased, the formation efficiency of J-PMC increased while the thermal decoloration rate for J-PMC tended to decrease with increasing R. Therefore, it was inferred that the incorporation of PMC into the bilayer lowered the entropy of the bilayer and the thermal J-PMC decoloration reaction was governed by an entropy-driven process through transient disorder.

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A novel dual measurement system was constructed to evaluate hyperpolarizability β at the excited state of molecules in solutions. The system is based on nano-second (ns) Hyper- Rayleigh Scattering (FIRS) method with CW laser excitation. Optical enhancement and control of the nonlinear optical (NL0) properties of organic compounds can be expected at the excited state due to changes in dipole moments and oscillator strength caused by electron density distribution different from that at the ground state. In the HRS technique, a chromophore solution was irradiated by ns Nd:YAG laser of various intensities (frequency ω), and the scattered photons at 2ω were detected. The HRS intensity was proportional to the square of the incident laser intensity. The HRS signal was usually very weak and contained dark-noise. The dual HRS detection system dividing the Nd:YAG laser into two parts improved the signal/noise (S/N) ratio of HRS signals under excitation. The MRS measurement for p-nitroaniline was observed in methanol and 1, 4-dioxane solutions upon excitation with and without CW Ar laser at 457.9nm.

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Thymine derivatives having long alkyl chain showed a very high photoreactivity in a single crystal and gave only one isomer of photodimer while the photodimerization in solution gave the four isomers. The crystal structure determined by X-ray diffraction method suggested the formation of the trans-syn or cis-anti photodimer. The photodimer obtained, however, was identified as the trans-anti isomer from the NMR spectrum. It was concluded that the trans-anti photodimer was formed by disrotatory motion of the thymine in the crystal.

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Persistent spectral hole burning (PSHB) is not only one of the promising methods for realizing high density optical data storage, but also used as a rather new method of high resolution spectroscopy for investigating photochemical properties of organic dye molecules at low temperatures. The effects of addition of several organic and inorganic salts on the PSHB of resorufn and resazurin are recognized and compared to the effects of N, N, N′, N′-tetramethyl-p-phenylenediamine addition.

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The ultra-fast dynamics of transient photobleaching and recovery of cadmium sulphide nanoparticles with sizes of about 4.0nm diameter in self-assembled films of ethylenediamine amphiphiles was studied upon excitation with a femtosecond laser at 400 nm. Maximum photobleaching occurred within about 1 picosecond. The bleaching then recovered with multi-exponential kinetics. The peak of the transient photobleaching spectrum showed a progressive red shift as the time between the pump and probe pulses was increased. The observed transient spectral shifts have been explained in terms of the number of trapping sites present on the particle surface.

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Emission spectra induced by electron impact on some gaseous organosilicon compounds were measured by a single photon counting technique. Vinyltrimethylsilane and vinyltrimethoxysilane showed emission bands assigned to decomposition products, CH, H, and Si atom, and trimethylsilylacetylene and Trimethyl(2-propynyloxy)silane produced C₂ in addition to CH, H, and Si atom, indicating that C₂ species was originated from C≡C moiety in the parent mlecules. From the comparison of the emission intensity of Si atom produced from each parent molecule, it is concluded that cleavage of Si-C bond is easier than that of Si-O bond. By mixing acrolein molecule into the organosilicon compounds, emission intensity of Si atom decreased, suggesting that acrolein molelcule interacted with the organosilicon compounds to suppress the generation of Si atom.

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The photopolymer holographic recording material is composed of a monomer, a binder, a photoinitiator system that contains a sensitizer, a initiator and a hydrogen donor. The photopolymer materials is sensitive to red light (633nm), the effective exposure sensitivity of the photopolymer plate can be increased by adding the third beam to expose the photopolymer plate simultaneously during the initial holographic exposure. Mechanisms of photoinitiatng polymerization and hologram formation are discussed. More than 80% of reflection grating diffraction efficiency can be obtained. The holographic gratings have a good physical and chemical stability under ambient conditions.

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M/A value is introduced which is the mass ratio of compound to alkali soluble groups in the compound. The (M/A)_Pb of photoactive compound (PAC) before phortolysis, the (M/A)_Pa of PAC after photolysis and the R_b/a which is ratio of (M/A)_pb to (M/A)_Pa, are calculated, discussed and compared with NQ/M value used before. It is proved that the (M/A)_pb can be interpreted as ratio of dissolution inhibition to dissolution acceleration of PAC before photolysis and the (M/A)_pa is that of PAC after photolysis; the R_b/a can be ratio of dissolution inhibition to dissolution acceleration before and after photolysis essentially, and it can also be named as index of dissolution inhibition to dissolution acceleration. It is more reasonable and more reliable than using NQ/M as dissolution inhibition index to represent dissolution inhibition effect of PAC.

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The photopolymerization system was composed of bis(η-5-cyclopentadienyl)-bis[2, 6- difluoro-3-(1-H-pyrrolyl)phenyl]titanium (Titanocene) and Methylmethacrylate (MMA).The relationship between the photopolymerization rate and the concentration of Titanocene and MMA was studied in trichloromethane solution at 30°C by using dilatometer. Also, the preliminary research and discussion on the mechanism of photopolymerization initiated by Titanocene in the visible light were completed.

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In this paper, through esterifying reaction of poly(styrene-co-maleic anhydride) resin with hydroxyethyl acrylate, acryl group and free carboxylic acid are introduced into the side chain of resins. So the developing speed in alkaline solution and photosensitive properties are improved. Through comparing five kinds of resins, a good result was obtained. The photosensitivity, resolution and halftone dot repetition of printing plate used A-3 resin have 6.05mJ/cm², 4μm and 2% respectively.

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The colorless fluorane dye and iodonium salt system can undergo an electron transer to generate ring-opening color form with photolysis of iodonium salt to yield active radical species exposed to UV light. Such system not only is capable of initiating polymerization of vinyl monomers, but also can induce the color formation and approach high color density. Effects of different chain length and countenon for diaryliodonium salts on color formation were further studied. The colorant formed from fluorane and iodonium salt in photocrosslinking film possesses good thermal stability and durability to solvents.

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Positive photoresist manufactured from diazonaphthoquinone (DNQ) with novolac, has been used, for long time, in IC fabrication. However, the requirement on the positive photoresist's quality must be increased continuously. The quality of photoresist is evaluated by the high resolution (μm), the high photosensitivity, the good mechanical, physical and chemical nature. In order to solve and satisfy the above-mentioned requirements, in the scientific research, there are the following variants:
1. To change the chemical composition of DNQ.
2. To manufacture the polymer blend as carrier for photoresist.
3. To study the compatibility of the mixed photoresist.
4. To study kinetics of processes of developing photoresist.

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A kinetics of surface transformations and ashing of high energy high dose As⁺ implanted resists was studied. Continuous bulk polymer structures, having minimum cross-sectional dimensions 10-30 times larger than the initial resist thickness, were found. These structures, named as giant folds, are formed as a result of heating and melting of the normal polymer resist sub-layer and its interaction with a mechanically deformed implanted resist layer. The giant folds are responsible for the most difficult to remove surface remaining features of ion implanted resists processed in downstream gas discharge ashers. It is shown that the main problem of dry ashing of ion implanted resists of this type is accounted for the flow patterns of the normal resist sub-layer but not the hard implanted surface layer itself.

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Pyrolysis of polysilanes with different molecular weights, solid states and substituents has been studied by quadrupole mass spectroscopy. The analysis of kinetics on the gas evolution spectra of a unit of the polysilanes gives their activation energies having Gaussian distributions. The number reduction of the weak Si-Si bonds with the decrease of the chain length of polysilanes results in the increase of activation energy of decomposition. The activation energy is also affected by the kind of solid states of polysilane. Because of the stronger interaction among the molecules, polysilane film has higher activation energies than powder. Due to the photodegradation and oxidation of polysilanes, photooxidized film has higher activation energies of decomposition and a broader distribution of activation energies than the unoxidized film. Furthermore, substituents give intense effects on the activation energies and the order of the decomposition reactions. It is found that the decomposition reactions occur at the low temperature if the substituents are easy to be disconnected from Si.

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We studied the coagulation which can occur in collected resist solutions and offer a resist reclamation system suitable for simple Matrix Liquid Crystal Display (SMLCD)- manufacturing lines. A lot of particles under a few μm in size are fonned in the collected solution during a roll-coating process; most particles are coagulacontaining various metal ions coming from the conditions the resist encounters. These coagula can be filtered. On the other hand, the increase in viscosity caused through the coating process is adjusted to its original state by adding a resist solvent. When the collectedphotoresist is kept at a room temperature for 50 days, needle-shaped crystals appear in the resist solution. These crystals were determined to be ammonium zinc sulfate hexahydrate by means of X-my diffraction analysis, and their formation can be avoided by carefully selecting the rubber material on the surface of rolls. When the collected resist is kept at an elevated temperature of 40°C for 100 days, bead-like coagula appear in the solution. The beads consist not only of thermally modifiedphotoactive compounds (PAC) but also of novolak resin. Areclamation system which is composed of a double cylindrical viscometer and a microfilter unit has been tested for more than half a year, and was found to perform 30.0±0.5 cP in viscosity and to reach an equilibrium on water content; about 1%.

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This paper describes a novel water-soluble radical photoinitiator, sodium 4-[2-(4- morpholino)benzoyl-2-dimethylamino]butylbenzenesulfonate (MBS) and an "environmentally friendly" photopolymerization resist system using MBS. MBS has been synthesized by sulfonation of 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)- butanone-1 (BDMB), which promises great utility in organic solvent systems. MBS shows sufficient solubility in water and has high photosensitivity comparable to that of BDMB. Water-soluble photoresists composed of base polymers, a trifunctional epoxy acrylate monomer DA-314 and MBS have also evaluated. The resist using polyvinylpyrrolidone (PVP) has shown high sensitivity (0.23mJ/cm²).

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Based on the reaction of vapor HF and SiO₂ at a temperature of above 100°C, development-free vapor photolithography (DFVP) eliminates the development step in conventional process. Under the etching condition, only in the presence of accelerators can the etching reaction occur. The accelerators catalyze this nucleophilic reaction by raising the nucleophilic activity of HF or activating the leaving group in substrate. Photochemical reaction leads to the concentration difference of accelerators between exposed area and unexposed area and thus results in the area-selective etching.

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