Photochemical Proton Generation Mechanism in Poly-methacrylate Resist Films

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244

Photochemical Proton Generation Mechanism in Poly-methacrylate Resist Films

Norihito Ohmori, Masayuki Hata, Tyuji Hoshino, Minoru Tsuda

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Keywords: sulfinium cation radical, proton generation mechanism, Sulfonium salts, ab initio MO, methacrylate polymer, chemically amplified resist

JOURNAL FREE ACCESS

1998 Volume 11 Issue 3 Pages 395-398

DOI https://doi.org/10.2494/photopolymer.11.395

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© The Technical Association of Photopolymers, Japan

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