Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
New Single-Component Resists Based on Functional Polynorborneneimides by Chemical Amplification for Deep UV Lithography
Chan-Woo Lee, Jung-Han Shin, Jong-Hee Kang, Jong-Man Kim, Dong-Keun Han, Kwang-Duk Ahn
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Keywords: single-component resists, norborneneimide polymers, polymeric photoacid generators, deep UV resists
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1998 Volume 11 Issue 3 Pages 405-408

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© The Technical Association of Photopolymers, Japan
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