Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Novel Deep UV Photoresist Based on Thermal Cross-Linking and De-Cross-Linking of Cross-Linkable Photoacid Generator
Seong-Yun MoonJae-Sun KooSeung-Hun OhSang-Kyun LeeShin-Ee Kang
Author information
JOURNAL FREE ACCESS

1998 Volume 11 Issue 3 Pages 439-443

Details
Abstract
We have synthesized a series of thermally cross-linkable photoacid generators. Among them, we used bis(4-(2-(vinyloxy)ethoxy)benzene)-4-methoxybenzene sulfonium triflate and tris(4-(2-(vinyloxy)ethoxy)benzene) sulfonium triflate for two or three component photo-polymers, containing a phenolic binder polymer and a cross-linkable photoacid generator. On irradiation with deep UV, the photopolymer films had sensitivities of ca. 10-20 mJ/cm2. The films, especially composed of poly(p-hydroxystyrene-co-styrene), 2, 2-bis(4-(2-(vinyloxy)ethoxy)phenyl)propane, and a cross-linkable photoacid generator, showed the high resolution of 0.24μm L/S under KrF excimer laser stepper (NA 0.45).
Content from these authors
© The Technical Association of Photopolymers, Japan
Previous article Next article
feedback
Top