Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
New Alicyclic Polymers Based on Protected Dinorbornene Monomers for Application As Deep UV Resists
K.-D. AhnJ.-H. KangC.-W. LeeJ.-M. KimD.-K. HanJ.-H. LeeI. ChoS.-Y. MoonJ.-S. KooS.-K. Lee
Author information
JOURNAL FREE ACCESS

1998 Volume 11 Issue 3 Pages 499-503

Details
Article 1st page
Content from these authors
© The Technical Association of Photopolymers, Japan
Previous article Next article
feedback
Top