Abstract
Process simulators for predicting pattern configuration for photo-resist have been studied vigorously and been commercialized. In such a simulation for photo-definable polyimides (PDPI), however, prediction by using the commercial simulators is quite difficult because patterns of PDPI are influenced by many factors. A process simulator designed exclusively for PDPI was developed in consideration of these factors. According to the PDPI simulator developed here, although quantitative analyses are not enough, visualizing phenomena occurred in PDPI process might be helpful for the new PDPI development, process development and analysis of failure in patterning processes. In this paper, as an example, a suggestion for improving contrast of aqueous alkali developable positive tone PDPI was demonstrated.
