Investigation of Discrimination Enhancement with New Modeling for Poly-Hydroxystyrene Positive Resists

Jun Hatakeyama; Shigehiro Nagura; Toshinobu Ishihara

doi:10.2494/photopolymer.13.519

Jun Hatakeyama, Shigehiro Nagura, Toshinobu Ishihara

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Keywords: chemically amplified resist, discrimination enhancement, dissolution distribution, poly-hydroxystyrene

JOURNAL FREE ACCESS

2000 Volume 13 Issue 4 Pages 519-524

DOI https://doi.org/10.2494/photopolymer.13.519

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Abstract

Discrimination enhancement of poly-hydroxystyrene based chemically amplified positive resists was investigated with acid and base neutralization model in Eq. 8. Relationship of deprotecting reactivity and discrimination property was reported in Fig. 7. Dissolution distribution in resist film depth was discussed to be important characteristic to fabricate fine sub-quarter micron pattern in Fig. 9.

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