Study of PAG Size Effect on Lithographic Performance of 157nm Resists

Ryotaro Hanawa; Kazuhiko Hashimoto; Yasunori Uetani

doi:10.2494/photopolymer.15.619

Journal of Photopolymer Science and Technology

Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244

Study of PAG Size Effect on Lithographic Performance of 157nm Resists

Ryotaro Hanawa, Kazuhiko Hashimoto, Yasunori Uetani

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Keywords: 157nm Resists, chemically amplified resists, protected polynorbornane polymer, anion size of TPS type PAG

JOURNAL FREE ACCESS

2002 Volume 15 Issue 4 Pages 619-624

DOI https://doi.org/10.2494/photopolymer.15.619

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Abstract

Lithographic performances of 157nm resists prepared by partially protected NBHFAMOM polymer were compared by using different size of anion of TPS PAG. Vacuum ultra violet spectroscopy measurement, discrimination curve measurements by 157nm open flame exposure, 193nm and 157nm imaging results were examined. Higher resolution and better profile was observed for larger anion size of TPS PAG.

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