Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
F2 Laser Resist with Fluorinated Polymers
Takuya NaitoSatoshi SaitoNaomi ShidaTohru Ushirogouchi
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2002 Volume 15 Issue 4 Pages 689-692

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Abstract
Fluorinated organic compounds are applied as F2 laser resists due to their high transparency at 157nm. The relationship between numbers/positions of fluorine atoms in a repeating unit of the fluorinated polymers and their physical/chemical properties (solubility parameter and hydrophilicity) for F2 laser resist is discussed. Fluorine at suitable position improves hydrophilicity without lowering the solubility parameter.
We propose a novel polymer suitable for F2 excimer laser resists consisting of the polymer with fluorine atoms connecting to proper positions.
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© The Technical Association of Photopolymers, Japan
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