Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Peeling Property of Resist Pattern in Water Analyzed by Atomic Force Microscope
Akira Kawai, Daisuke Inoue
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Keywords: adhesion, peeling, atomic force microscope, surface free energy, liquid environment, intrusion
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2002 Volume 15 Issue 5 Pages 757-758

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© The Technical Association of Photopolymers, Japan
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