Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Resist Pattern Peel due to Resonance Effect of Micro Tip
Akira Kawai
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Keywords: resist, adhesion, peel, resonance, atomic force microscope, lithography, stress
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2002 Volume 15 Issue 5 Pages 759-760

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© The Technical Association of Photopolymers, Japan
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