Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Tung oil-Pyrogallic Acid Resin (TPA) and Its Application to a Positive Photoresist
Shangxian YuJiangnan CuFang WangXiaoyuan FuTing Luo
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1989 年 2 巻 1 号 p. 51-56

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A lung oil-pyrogallic acid resin(TPA) was synthesized successfully.After that, an ester condensation reaction between TPA and 1, 2-naphthoquinone 2-diazide 5-sulfochloride(NAC-5) was carried out resulting in the naphthoquinone diazide sulfonated tung oil-pyrogallic acid resin(NAC-5-TPA) as shown in formula[1]: It can be used for a positive resist developed by alkaline solutions. The minimum quantity of exposure energy required for the colour change of this resist and the quantity of exposure energy required for preparing the plate were 23.9mJ/cm2 and 320mJ/cm2 respectively. It has considerably high resolution power and acid and organic solvent resistances.
Quantum chemical studies on the mechanism of the reaction of introducing pyrogallic acid into tung oil have been performed, the results obtained are as follows: When oxalic acid was used as a catalyst, the reaction is mainly orbital controlled. The research on the reaction kinetic of UV-photolyzis process for NAC-5-TPA resin indicated that the photolysis reaction follows the rule of a first-order reaction and is a pure photolysis process.
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© The Technical Association of Photopolymers, Japan
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