1994 年 7 巻 1 号 p. 59-66
A new water-soluble photoresist consisting of a polymeric azide sensitizer and Poly(acrylamide-diacetone acrylamide) (PAD) was developed for this potential application to a black matrix process in a color picture tube fabrication. The polymeric azide sensitizer was prepared by the condensation reaction of Poly(4-vinylacetophenone-maleic acid) with 4-azidobenzaldehyde-2-sodium salt. This newly developed resist shows higher sensitivity than that of our current resist that is composed of 4, 4′-diazidostilbene-2, 2′-disulfonate and PAD. The resist exhibits the reciprocity-law failing characteristic that is desirable for high contrast patterning. One of the mechanisms of increase in sensitivity is presumed to be due to the tangle of polymers between a polymeric azide sensitizer and PAD.
