Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Chemically Amplified Resists. V
Photochemical Proton Generation Mechanism from Triphenylsulfonium Salts
Setsuko Oikawa, Norikazu Fujii, Masayuki Hata, Minoru Tsuda
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1994 Volume 7 Issue 3 Pages 483-486

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© The Technical Association of Photopolymers, Japan
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