LITHOGRAPHY SYSTEM EVOLUTION: A PERSPECTIVE ON A METHODOLOGY FOR THE RAPID DETERMINATION OF O.25um PROCESS CAPABILITY

Abstract

Introduction of new semiconductor technology to the market place depends on how quickly advanced research and development organizations can provide viable products. A methodology is described and examples given that reduce the development time associated with leading edge lithography systems. An interactive development loop focusing on improvement of dimensional control and depth of focus is discussed. Techniques to improve the areas of design, data collection and analysis are presented.