1996 年 9 巻 4 号 p. 707-714
Self-doped conjugated polymers are described concerning their synthesis and physical properties for an application as coating materials on electron-beam resists. As examples, the characteristics of two types of water-soluble polyheterocycles are presented regarding this application. The coated films on the resists are respectively evaluated on both preventive effect in a positional error in electron-beam writing process and stabilization effect in sensitivity of a chemically amplified resist. It was noted that the self-doped polymers may be suitable materials for manufacturing processes using electron-beam lithography.
