抄録
With an aerosol CVD process by using zirconium acetylacetonate and triphenyl phosphate dissolved in a mixture of acetylacetone and benzylic alcohol, we achieved to deposit mixed P2O5-ZrO2 films between 480°C to 600°C. The P2O5 content varied from 0% up to 60%. We have systematicaly studied the composition of the deposited films in regards with the deposition parameters. In particular we have noticed the influence of the hygrometric degree of the carrier gas and of the temperature used for the dissolution of the organometallic precursors. The highest the dissolution temperature was, the most the phosphorus content was. The evolution of X-ray diffraction patterns and of the I. R. spectra are discussed in function of the composition of the films and the temperature of the post annealing treatment. After annealing at 700°C for 20hours the films with a P2O5 content between 11% and 45% are still amorphous and their refraction index decreased from 2.1 down to 1.65.
