Exposure characteristics of quartz using focused ion beam

Abstract

When irradiating the focused ion beam to quartz, exposing, and having developed it with the developer afterwards, the depth of 45nm was confirmed. It is thought that the irradiation effect with the ion made quartz meltable with the developer. Moreover, there is a feature that the processing speed is faster than the direct processing that uses the focused ion beam when the pit is formed. In this research, amount (μC/cm²) of doses is changed. It was tried to investigate the processing characteristic of quartz, and to find efficient processing conditions of quartz.