抄録
Ultra-precision finishing of Silicon Carbide coatings produced by chemical vapour deposition (CVD) usually involves several process steps such as grinding and polishing. In this paper, an innovative shape adaptive grinding (SAG) tool is introduced that allows finishing of CVD Silicon Carbide down to 1nm Ra with high removal rates up-to 100mm3/min. The SAG tool is capable of elastically complying with freeform surfaces, whilst rigidity at small scales allows for grinding to occur. Since the material removal is time dependent, this process can be used for iterative form error improvement through feed moderation of the sub-aperture removal area.
