Abstract
We propose a novel metal-free process to flatten a next-generation semiconductor surface. A key in this process is to develop high-quality graphene catalysts to reduce O2 molecules to H2O in solutions. In this presentation, we first show a method to obtain the flakes of reduced graphene oxide which are dispersive in solutions. We also demonstrate nitrogen doping to a graphene network. And the catalytic activity of these graphene-based materials is investigated by electrochemical measurements.