Abstract
In this paper, we built a simulation model of production flow around the ion implantation process in a semiconductor factory. This process is a bottleneck process because of frequent malfunctions and hence, the management of this process is important to improve the efficiency of semiconductor production. As a characteristic of the semiconductor production, products are reenterred to the manufacturing processes several times. Moreover at each machine in the ion implantation process, a couple of different ions are used and the change of ions requires a long set up time. Those characteristics made the mathematical analysis difficult so that a simulation model approach is taken. We describe the procedure in the simulation model and the results of trial runs.
