抄録
Hull Cell is an experimental plating cell in which a cathode is obliquely arranged to an anode, and the plating with wide range of electrical current densities can be tested by only once electrodeposition. The cell is therefore widely used for decision of plating condition, make-up of bath compositions and control of plating bath. But it is difficult to calculate theoretically and correctly the current densities on arbitrary points on a cathode. So, generally some approximate experimental formulas have been used. In this report, the authors suggest a concentric cell instead of the Hull Cell, and it was named Tena Cell. Current densities on optional points of cathode can be precisely and simply calculated in this cell. Moreover, the cell can be used like a Harling Cell being arranged two cathodes to both side of an anode. Electroplating has been studied on two cathodes that are divided into five equal parts each. In this study, we used copper (II) sulfate and copper (II) borofluoride solutions for plating baths. Experimental results are nearly coincide with theoretical values. As a result, we propose the Tena Cell as a more simple and precise cell than the Hull Cell.
