抄録
An electroless nickel deposit on glass has been studied to use as a micro-pattern. For this purpose, metal to glass adhesion and the surface smoothness is substantially important. Good adhesion strength between glass and the deposited nickel obtained by immersing the glass in a the conventional chromic-sulfuric acid etching solution and by treating with sodium hydroxide solution. A high levelling nickel deposit was also obtained by using sodium citrate or ammonium citrate as a condition complexing agent in the electroless nickel bath. The optimum etching composition and operating for the production of micro-patterns were found to be 8% HNO3-70% H3PO4-22% H2O, temperature: 25°C, etching time: 5-7min.
