抄録
The result of the test of electrodeposition of chromium on aluminium is favorable with the following preparation and deposition conditions:
Aluminium surface is first etched by hydrochloric acid, then dipped for 3-10 seconds in mixed acid solution of 3 parts of HNO3 (sp. gr. 1.42) and 1 part of HF (50%). On thus prepared surface, as an intermediate film, zinc or copper is electrodeposited from cyanide bath.
Chromium deposition from the bath of 250g/l of CrO3 and 1.25g/l H2SO4, at the temperature of more than 40°C, by the current density of 30A/dm2, and for more than 30min is pretty thin but nice and tight.
