表面技術
Online ISSN : 1884-3409
Print ISSN : 0915-1869
ISSN-L : 0915-1869
プラズマCVDにより作製した非晶質炭素膜の光学的性質
杉村 博之
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1990 年 41 巻 5 号 p. 545-548

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Amorphous carbon films were deposited by RF plasma CVD using methane source gas. The optical bandgaps of the films as measured by transmission spectroscopy varied from 1.0 to 1.8eV depending on CVD conditions. The complex refractive indices n-ik of the films were also investigated, and were found to vary from 1.6 to 2.0. The films were almost transparent to near infrared light, but showed strong absorption in the visible spectrum range. The optical properties of the films changed when oxygen and hydrogen were added to the source gas. The extinction coefficient k increased with the addition of oxygen and decreased with addition of hydrogen, but there was little change in refractive index n.

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