抄録
Titanium oxide thin films were prepared by a pulsed laser deposition method using a Ti powder material target. Atomic force microscopy images of the films appeared to be nearly same as those of films prepared using a Ti bulk target. X-ray diffraction and X-ray photoelectron spectroscopy measurements suggested that polycrystalline titanium dioxide (TiO2) thin films can be prepared using a Ti powder target, and that their properties depend on substrate temperature and the argon and oxygen gas mixture. These results suggest that titanium oxide thin films can be prepared using a Ti powder target and their quality was almost the same as those of compared with the films prepared using a Ti bulk target.
