Phonon-Drag Effect on Seebeck Coefficient in Co-Doped Si Wire with Submicrometer-Scaled Cross Section

抄録

The Seebeck coefficient of Si wire co-doped with P and Ga atoms is investigated for applying thermoelectric devices. The observed Seebeck coefficient is closed to the theoretical values of electronic part of Seebeck coefficient due to the electronic transport. From the estimation of phonon scattering processes, it is found that the phonon-drag contribution to the Seebeck coefficient in co-doped Si wire is mainly governed by the phonon-boundary scattering.