抄録
We have investigated on a random-texturing process for multi-crystalline Si solar cells by plasmaless dry etching, with chlorine trifluoride (ClF3) gas treatments. The reflectance of textured surfaces was reduced to below 20% at a wavelength of 600nm. In this study, we tried to improve the electrical characteristics by modifying the fabrication process. The substrate surfaces were dry etched by chlorine trifluoride gas and subsequently etched with an acid solution to form appropriate textured structures. The improved electrical characteristics were demonstrated.
