L-Shaped Tunneling Field-Effect Transistors for Complementary Logic Applications

抄録

In order to implement complementary logic function with L-shaped tunneling field-effect transistors (TFETs), current drivability and subthreshold swing (SS) need to be improved more. For this purpose, high-k material such as hafnium dioxide (HfO₂) has been used as gate dielectric rather than silicon dioxide (SiO₂). The effects of device parameters on performance have been investigated and the design of L-shaped TFETs has been optimized. Finally, the performance of L-shaped TFET inverters have been compared with that of conventional TFET ones.