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IEICE Transactions on Electronics
Vol. E98.C (2015) No. 2 pp. 133-135



Special Section on Recent Progress in Organic Molecular Electronics

We demonstrated a novel technique to fabricate nanosized structures on a Nafion membrane, using thermal nanoimprinting with a 5 × 5 μm2 square pattern Si mold without any polymer damage. A 24 MPa thermal imprinting pressure was used for 10 min. We observed high aspect ratio (∼1:10) pillars on the surface after imprinting at 200°C. Finally, we used a novel quartz mold with a 200 nm resolution dot pattern.

Copyright © 2015 The Institute of Electronics, Information and Communication Engineers

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