IEICE Transactions on Electronics
Online ISSN : 1745-1353
Print ISSN : 0916-8524
Special Section on Progress towards System Nanotechnology
Recent Situation of the UV Imprint Lithography and Its Application to the Photonics Devices
Masashi NAKAO
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Keywords: UV-imprint lithography, PDMS, LN filter, dry etching, sapphire substrate, alumina nanohole
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2016 Volume E99.C Issue 3 Pages 333-338

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Abstract
The individual steps of UV imprint lithography have been explained in detail from the points of manufacturing nano-structures. The applications to photonic devices have been also introduced.
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© 2016 The Institute of Electronics, Information and Communication Engineers
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