Fundamentals of Chemical Vapor Deposition of Atomic Layer Materials

Abstract

Atomic layer materials including graphene, hexagonal boron nitride, and transition metal dichalcogenides have attracted great attentions due to their unique physical properties. A chemical vapor deposition (CVD) method of atomic layer materials has substantially progressed in the past decades toward realizing the synthesis of large-scale, high-quality, and structure-controlled crystals. In this paper, we briefly summarize the basics of CVD synthesis of atomic layer materials.