ヘリウムを添加したアセチレンプラズマ中でのアモルファス炭素膜堆積過程の赤外分光計測

桒田 篤哉; 中居 辰夫; 大石 侑叶; 佐々本 凌; 篠原 正典; 田中 諭志; 松本 貴士

doi:10.1380/vss.66.442

Special Feature : Transactions of the Annual Meeting on the Japan Society of Vacuum and Surface Science 2022[II]

An Infrared Spectroscopic Study of Amorphous Carbon Film Deposition Process during Plasma Generated in Helium-Added Acetylene

Atsuya KUWADA, Tatsuya NAKAI, Yuto OOISHI, Ryo SASAMOTO, Masanori SHINOHARA , Satoshi TANAKA, Takashi MATSUMOTO

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Keywords: infrared spectroscopy, film deposition, acetylene plasma, helium

JOURNAL RESTRICTED ACCESS

2023 Volume 66 Issue 8 Pages 442-447

DOI https://doi.org/10.1380/vss.66.442

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Abstract

Film deposition process during helium-added acetylene plasma is investigated with multiple-internal-reflection infrared absorption spectroscopy (MIR-IRAS). The sp²-C, the sp-C, the sp³-CH, -CH₂, and the sp-CH components are formed in the deposited film. We found that the films are deposited through the addition reaction during the plasma. We also suggest that the amounts of the sp³-CH, -CH₂ components are etched during He-added acetylene plasma.

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