Vacuum and Surface Science
Online ISSN : 2433-5843
Print ISSN : 2433-5835
Special Feature : Film Deposition by Controlling Plasma-induced Surface Reactions
Applied Research on Si-containing Diamond-like Carbon Films and Fundamental Research on Si Incorporation into the Films
Hiroyuki KOUSAKAAkinori ODA
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2024 Volume 67 Issue 2 Pages 52-58

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Abstract

In this paper, we focus on the performance improvement of diamond-like carbon (DLC) by adding Si atoms, and summarize the conventional research developments centered on the friction application of Si-containing DLC (Si-DLC) thin films. In addition, we introduce new research and application development of Si-DLC in recent years. After recognizing and sharing the importance of Si incorporation into the Si-DLC thin films, we also introduce the mass spectrometric measurements of Si-containing hydrocarbon ions and radicals in tetramethylsilane plasmas for the purpose of understanding the plasma used for the synthesis of Si-DLC thin films.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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