Various changes in multilayer thin-film coatings and their substrates due to laser ablation were investigated. Absorption-type (TiO
2/SiO
2) and nonabsorption-type (HfO
2/SiO
2) multilayer coatings were irradiated with 266 nm, nanosecond laser pulses. After laser irradiation, the ablated areas were machined with a focused ion beam (FIB) and the cross sections were observed using a scanning electron microscope (SEM). For the absorption-type coating, partial delamination of the coating was observed at the boundary between the TiO
2 and SiO
2 layers in regions subjected to weak irradiation surrounding the area subjected to the irradiating laser beam. The formation of mixed molten states and partial voids inside nonablated multilayers was observed. For the nonabsorption-type coating, the formation of a modified layer on the surface of the fused-quartz substrate caused by laser ablation of the multilayers was observed. These observations provide useful guidelines for the laser processing of thin-film-coated devices.
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