Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
Volume 59, Issue 3
Displaying 1-4 of 4 articles from this issue
Regular Papers
Regular Article
  • Yoichi HOSHI, Shin-ichi KOBAYASHI, Takayuki UCHIDA, Yutaka SAWADA, Hao ...
    2016Volume 59Issue 3 Pages 59-64
    Published: 2016
    Released on J-STAGE: April 02, 2016
    JOURNAL FREE ACCESS
     Deposition of top Al electrode films by a low damage Facing-Target sputtering method (FTS) have been attempted to fabricate an Organic Light Emitting Diode (OLED) (glass substrate/ITO /NPB/Alq3/BCP/LiF/Al). Suppression of the high energy secondary electron incidence to the substrate during the sputter-deposition of the aluminum electrode films was effective to reduce the light emitting voltage and improve the luminance efficiency of the OLED. In addition, optimization of sputtering gas pressure and reduction of the sputtering current was necessary in the deposition the electrode films to obtain the OLED with good performance. Compared with the OLED fabricated by vacuum evaporation, the OLED fabricated by our low damage sputtering system at the optimum conditions showed better injection current-luminance efficiency, although it had a little bit larger operating voltage.
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