The present status of a new vacuum ultraviolet/soft X-ray (VUV/SX) beamline (BL-13A) used for the study of organic thin films adsorbed on surfaces is described. The base pressure of BL-13A is maintained below 1×10
−8 Pa in order to prevent contamination of the optics by residual gases. The measured performance is as follows: photon-energy region, 30-1,200 eV; photon flux, 10
9-10
11 photons s
−1; photon-energy resolution (
E/Δ
E), 10,000 at a photon energy of 401 eV; spot size (horizontal\ imes;vertical) at the second focus, ≈630×120 μm; photon-energy drift, ≤±0.02 eV at a photon energy of 244.39 eV; reduction of photon flux in the C
K-edge region, ∼50%.
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