Effect of gas temperature on NOx removal by using dielectric barrier discharge (DBD) was investigated experimentally. NO/O
2/N
2 system was used as the test gas. The initial NO concentration was set as 100ppm. The experiment was conducted under two conditions with and without oxygen. The gas temperature was changed in a range of
Tg=20°C~260°C. As the result, in the case of NO removal in nitrogen atmosphere (O
2=0%), NO was mainly reduced by N radical and several ppm of NO
2 and N
2O were produced. NOx removal efficiency at
Tg=20°C (room temperature) was slightly higher than that at
Tg=60~260°C. On the other hand, in the case of NOx removal in oxidative atmosphere (O
2=10%), NO was mainly oxidized by O
3 and reduced by N radical at
Tg=20°C. At higher gas temperature conditions (
Tg=60~260°C), NO
X concentration exceeded the initial NO concentration of 100ppm. The oxidation of NO with O
3 was controlled because the amount of O
3 was deceased due to the thermal decomposition of O
3. Also, NO, NO
2 and N
2O were produced by corona discharge in oxidative atmosphere. Thus, it was considered that the increase of NO
X in high temperature condition was caused by the thermal decomposition of O
3 and the formation of NO, NO
2 and N
2O.
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