e-Journal of Surface Science and Nanotechnology
Online ISSN : 1348-0391
ISSN-L : 1348-0391
Regular Papers
Raman-Scattering Spectroscopy of Epitaxial Graphene Formed on SiC Film on Si Substrate
Yu MiyamotoHiroyuki HandaEiji SaitoAtsushi KonnoYuzuru NaritaMaki SuemitsuHirokazu FukidomeTakashi ItoKanji YasuiHideki NakazawaTetsuo Endoh
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2009 年 7 巻 p. 107-109

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By conducting a 1200°C vacuum annealing of a 3C-SiC(111) ultrathin film preformed on a Si(110) surface, we have succeeded in forming a graphene layer on a Si substrate. Raman-scattering spectrum from this surface presents a distinct 2D band, whose deconvolution into four subcomponents indicates that the film mostly consists of a two-layer graphene. The peak position is blue-shifted from that of a free-standing graphene formed by a mechanical exfoliation method, suggesting a compressive stress in the film. [DOI: 10.1380/ejssnt.2009.107]

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この記事はクリエイティブ・コモンズ [表示 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by/4.0/deed.ja
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