Electrochemistry
Online ISSN : 2186-2451
Print ISSN : 1344-3542
ISSN-L : 1344-3542
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Oxygen Reduction Reaction of Ta-C-N Prepared by Reactive Sputtering with Heat Treatment
Jin-Hwan KIMAkimitsu ISHIHARAShigenori MITSUSHIMANobuyuki KAMIYAKen-ichiro OTA
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2007 年 75 巻 2 号 p. 166-168

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Ta-C-N electrocatalysts were prepared by reactive R.F. sputtering with heat treatment in the temperature range from 70 to 800°C. The Ta-C-N was found to have high electrochemical stability in 0.1 mol dm−3 H2SO4. The catalytic activity for the oxygen reduction reaction of the sputtered Ta-C-N increased with the increasing heat treatment temperature. In particular, the current of the ORR on the Ta-C-N with the heat treatment temperature of 800°C was observed at about 0.73 V vs. RHE. It was found that the crystallinity of the Ta-C-N would affect the catalytic activity for the ORR.

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© 2007 The Electrochemical Society of Japan
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